首页> 外文OA文献 >Measuring Thickness Changes in Thin Films Due to Chemical Reaction by Monitoring the Surface Roughness with In Situ Atomic Force Microscopy

【2h】

Measuring Thickness Changes in Thin Films Due to Chemical Reaction by Monitoring the Surface Roughness with In Situ Atomic Force Microscopy

机译：用原位力显微镜监测表面粗糙度，测量化学反应薄膜的厚度变化

代理获取

本网站仅为用户提供外文OA文献查询和代理获取服务，本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文，但由于OA文献来源多样且变更频繁，仍可能出现获取不到、文献不完整或与标题不符等情况，如果获取不到我们将提供退款服务。请知悉。

页面导航

著录项
引文网络
相似文献
相关主题

著录项

作者
L. Y. Beaulieu; A. D. Rutenberg; J. R. Dahn;
展开▼
作者单位

展开▼
年度 2015
总页数
原文格式 PDF
正文语种
中图分类

相似文献

外文文献
中文文献
专利

1. Measuring thickness changes in thin films due to chemical reaction by monitoring the surface roughness with in situ atomic force microscopy [J] . Beaulieu LY., Rutenberg AD., Dahn JR. Microscopy and microanalysis: The official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada . 2002,第5期

机译：通过原位原子力显微镜监测表面粗糙度，测量由于化学反应导致的薄膜厚度变化
2. Measuring the thickness and thickness uniformity of ultra-thin AlO{sub}x films in magnetic tunneling junctions by combined RBS and conducting atomic force microscopy [J] . E. Z. Luo, S. K. Wong, A. B. Pakhomov, 電子情報通信学会技術研究報告. 磁気記録. Magnetic Recording . 2001,第400期

机译：结合RBS和原子力显微镜测量磁性隧道结中超薄AlO {sub} x薄膜的厚度和厚度均匀性
3. Measuring the thickness and thickness uniformity of ultra-thin AlO{sub}x films in magnetic tunneling junctions by combined RBS and conducting atomic force microscopy [J] . E. Z. Luo, S. K. Wong, A. B. Pakhomov, 電子情報通信学会技術研究報告. 磁気記録. Magnetic Recording . 2001,第400期

机译：通过组合RBS和导电原子力显微镜测量超薄ALO {SUB} X膜在磁隧道连接中的厚度和厚度均匀性
4. A Technique for Measuring the Film Thickness of Ultrathin Metallic Thin Films, 4-20 nm, Using Atomic Force Microscopy [C] . G. Acosta, D.D. Allred, R.C. Davis Society of Vacuum Coaters Annual Technical Conference; 20050423-28; Denver,CO(US) . 2005

机译：利用原子力显微镜测量4-20 nm超薄金属薄膜的膜厚度的技术
5. THREE-BEAM SHEARING INTERFEROMETER FOR MEASURING THIN FILM THICKNESS, SURFACE ROUGHNESS, AND SURFACE FIGURE. [D] . ALMARZOUK, KAIS. 1982

机译：用于测量薄膜厚度，表面粗糙度和表面图形的三束剪切干涉仪。
6. Using Atomic Force Microscopy to Measure Thickness of Passive Film on Stainless Steel Immersed in Aqueous Solution [O] . Rongguang Wang, Yunhui Li, Tian Xiao, -1

机译：使用原子力显微镜测量浸在水溶液中的不锈钢上的钝化膜厚度
7. In-Situ Atomic Force Microscopy Study of Surface Microstructure Stability On LiMn2O4 Thin Films [O] . 2013

机译：原位原子力显微镜显微镜研究LIMN2O4薄膜表面微观结构稳定性

Measuring Thickness Changes in Thin Films Due to Chemical Reaction by Monitoring the Surface Roughness with In Situ Atomic Force Microscopy

著录项

引文网络

相似文献

相关主题

期刊订阅